 
|
Single Station Spin Coater for R&D Labs – Compact Benchtop Design with Customizable Speed up to 12,000 rpm
Λεπτομέρειες:
| Τόπος καταγωγής: | Κίνα |
| Μάρκα: | OSMANUV |
| Πιστοποίηση: | ISO9001 |
| Αριθμό μοντέλου: | Προσδιορισμός |
Πληρωμής & Αποστολής Όροι:
| Ποσότητα παραγγελίας min: | 1 Σετ |
|---|---|
| Τιμή: | Διαπραγματεύσιμος |
| Συσκευασία λεπτομέρειες: | Ξύλινη συσκευασία |
| Χρόνος παράδοσης: | 30-45 ημέρες |
| Όροι πληρωμής: | T/T |
| Δυνατότητα προσφοράς: | Διαπραγμάτευση |
|
Λεπτομερής ενημέρωση |
|||
| Τύπος εφαρμογής: | Βιομηχανικός | Μέγεθος Μηχανής: | 5000mm*2000mm*2000mm |
|---|---|---|---|
| Μέγιστη ταχύτητα: | 1000 φύλλα/Η | Αποδοτικότητα επίστρωσης: | Υψηλή απόδοση |
| Διασύνδεση ελέγχου: | Μια οθόνη αφής νάιλον 7 ιντσών | Μήκος ξήρανσης: | 24 m |
| σταθμός: | 24 σταθμός | Διαστάσεις μηχανής: | Μήκος 3000mm x Πλάτος 1500mm x Ύψος 1800mm |
| Επισημαίνω: | compact benchtop spin coater,single station spin coater for labs,spin coater with customizable speed |
||
Περιγραφή προϊόντων
Single Station Spin Coater for R&D Labs – Compact Benchtop Design with Customizable Speed up to 12,000 rpm
This customizable single-station spin coater is designed for precise thin-film deposition on substrates such as silicon wafers, glass slides, and polymer films. Available in benchtop R&D, integrated hotplate, and high-speed precision configurations. The system is fully customizable in chuck size, spin speed range, acceleration ramp profiles, and bowl material. Ideal for photoresist coating, sol‑gel deposition, nanoparticle films, and perovskite solar cell fabrication in research laboratories and pilot production lines. The compact design saves valuable bench space while delivering exceptional speed stability (< ±1% fluctuation) and low vibration operation.
Technical Parameters
| Parameter | Benchtop R&D Model | Integrated Hotplate Model | High-Speed Precision Model |
|---|---|---|---|
| Spin speed range (customizable) | 100 - 12,000 rpm | 300 - 10,000 rpm | 500 - 15,000 rpm |
| Speed accuracy | ±1 rpm | ±1 rpm | ±0.5 rpm (servo motor) |
| Acceleration control | 100 - 10,000 rpm/s | Programmable multi-step | 1 - 50,000 rpm/s |
| Substrate size (customizable) | Up to 150 mm (6") | Up to 200 mm (8") | Up to 200 mm (8") |
| Temperature range (optional) | N/A | Ambient - 300°C | N/A (optional heating cover) |
| Temperature accuracy | N/A | ±1°C | N/A |
| Program steps | 10 programs, 20 steps each | Up to 50 recipes | Unlimited programmable |
| Vacuum system | Integrated pump interface | Integrated chuck + pump | < 10⁻⁴ Torr (turbo option) |
| Bowl material (customizable) | Polypropylene (PP) | Stainless steel, PTFE coating | PTFE / Stainless steel 316L |
| Display | 4.3" LCD | 7" color touchscreen | 7" HMI touchscreen |
| Exhaust port | Ø50 mm rear | Ø110 mm | Ø110 mm (dual ports optional) |
| Power supply | 110/220V, 50/60Hz | 220V, 50/60Hz | 220V/380V, 50/60Hz |
| Dimensions (approx.) | 350 × 300 × 250 mm | 450 × 350 × 250 mm | 600 × 500 × 400 mm |
| Weight | ~15 kg | ~22 kg | ~35 kg |
Applications
- Semiconductor & MEMS: Photoresist coating on silicon wafers, electron beam lithography
- Optoelectronics: OLED, quantum dot thin films, anti-reflective coatings
- Materials science: Sol‑gel deposition, spin-on glass (SOG), nanoparticle films
- Biotechnology: Biosensor fabrication, microfluidic device coating
- Renewable energy: Perovskite solar cells, thin-film photovoltaic
- Optical industry: Lens hard coating (with UV curing option)
Customization Options
- Chuck design & size: Custom-machined vacuum chucks for round (up to 12"/300 mm) or square/rectangular substrates
- Spin speed range: Extendable up to 15,000 rpm for ultra-thin film applications (<10 nm thickness)
- Speed ramp profiles: Customizable acceleration/deceleration curves for edge bead control
- Bowl material: Polypropylene (PP), PTFE, stainless steel 316L - customizable for solvent resistance
- Temperature integration: Built-in hot plate (up to 300°C) or removable heating cover (up to 150°C)
- Dispense system: Manual syringe, semi-auto metering pump, or fully programmable auto-dispense
- Exhaust configuration: Rear / left / right / dual ports - customizable
- Motor type: Brushless DC or high-precision servo motor
- Software: Recipe management, real-time speed curve display, CSV data export
- Cleanroom compatibility: Class 10-100,000 with laminar flow option
- Safety features: Lid interlock, emergency stop, nitrogen purge
Key Features
- High precision: Speed stability < ±1% fluctuation for uniform film thickness
- Low vibration design: Brushless DC or servo motor for sensitive substrate processing
- Chemical-resistant bowl: Stainless steel or PTFE coating for aggressive solvents
- Programmable recipes: Multi-step speed and acceleration profiles for complex coating processes
- Quick-change chuck: Tool-free chuck exchange for different substrate sizes
- Safety interlock: Automatic stop when lid is opened during operation
- Data export: USB port for recipe backup and process data logging
- Compact footprint: Benchtop design saves valuable laboratory space
- Dual-use capability: Optional hot plate for pre-bake and post-bake integration
Support and Services
- Free process consulting and material testing (send us your substrates)
- Installation guide and calibration video included
- Remote troubleshooting within 24 hours
- 18-month warranty on motor and controller, 12-month on accessories
- Spare parts availability from local warehouses (US/EU/Asia)
- On-site training (available for customizable support packages)
- Lifetime technical support via email, phone, or video call
Packing and Shipping
Packing: Anti-static foam + reinforced plywood case (with desiccant for moisture-sensitive components)
Dimensions (standard): 55×45×45 cm carton | Gross weight: ~22 kg
Shipping: FOB Shanghai / CIF by sea, air, or rail
Lead time: 7-15 days for standard units; 20-30 days after customization confirmation (custom chucks/bowls require longer)
Customizable: Export packaging, drop-shipping labeling, and documentation available
Frequently Asked Questions
Q1: What is the maximum substrate size this spin coater can handle?
A: Standard models handle up to 150 mm (6") or 200 mm (8") diameter. For larger substrates up to 300 mm (12") wafers or 9" × 9" squares, we offer customizable chuck designs.
Q2: Can I use this spin coater for non-round substrates (e.g., rectangular glass slides)?
A: Yes. We offer customizable vacuum chucks for square, rectangular, and irregularly shaped substrates. Please provide your substrate dimensions for custom machining.
Q3: What is the typical film thickness uniformity?
A: With proper process optimization, thickness uniformity can reach <3% across a 150 mm wafer. Results vary by material viscosity and spin parameters - we offer free lab testing to confirm.
Θέλετε να μάθετε περισσότερες λεπτομέρειες σχετικά με αυτό το προϊόν
